DAS Environmental Expert

Gary Van Schooneveld is President of CT Associates, Inc. Gary has over 30 years of experience with high-purity fluid systems including chemical delivery and ultrapure water and the development and testing of their associated materials and components. He is the author or co-author of more than 45 technical papers and presentations. Gary is co-chair of the SEMI UPW Task Force and an active member of the IRDS UPW and IRDS Critical Components Task Forces. Gary as been a key contributor in the development and validation of SEMI specification for measuring filter retention below 15 nm (SEMI C79), particle shedding from critical components (SEMI F104) and extractables ion exchange resin rinse performance (SEMI C93). Gary has BS and MS degrees in Materials Engineering from Rensselaer Polytechnic Institute (Troy, NY) and an MBA from the University of Texas (Arlington, TX).

CT Associates

Please see my LinkedIn profile: https://www.linkedin.com/in/sergei-shatsman/

FTD Solutions

Tina is a civil engineer working for Kokosing, a self-performing heavy industrial contractor in the Midwest and Mid-Atlantic. She holds a BS in CE from Case Western Reserve University and a MS in CE from Cleveland State University. Tina is a licensed PE in IL, IN, MI, PA, OH.

Kokosing Industrial

Dr. Sriram (Ram) Ramamoorthy is a Supply Chain R&D Engineer/Technologist in Intel’s Fab Materials Organization managing specialty chemicals and filtration. Prior to this role, Ram was a senior process technology development engineer in Intel R&D fab in Oregon developing front end wet etch processes. Ram is an active member in IRDS and SEMI task forces and standards team. Ram received his Ph.D in Chemical Engineering from Rensselaer Polytechnic Institute (Troy, NY).

Intel

Dan’s almost three decades of experience as a facilities engineering manager, process engineer, design engineer, construction project manager and tool hookup design in the advanced technologies and semiconductor manufacturing industry has led to innovative solutions in his work. His innovations have resulted in industry-changing quality and cost savings breakthroughs, including defect reduction and innovative water reclaim and re-use systems. Dan is well established in the semiconductor industry as an Ultra-pure Water, UHP Chemical and Wastewater expert as shown in his leadership of industry roadmap and collaboration teams. He is certified by ASQ as a six sigma black belt. His roles include Co-Chair of International Roadmap for Device and Systems (IRDS) Yield Enhancement (YE) team, Co-Chair UPW SEMI Standards team, and UP Micro Conference Strategy Team. In addition to many industry publications, Dan also holds a patent for Reduction of Charging Induced Damage in Photolithography Wet Process.

Samsung Austin Semiconductor

I am a professional chemical engineer located in Kansas City. I focused on water and wastewater treatment design for the first 15 years of my career before transitioning into engineering and project management where I have mainly managed large water and wastewater projects for 10 years.

Kiewit

Kevin Wolfe is an environmental engineer working within the Global Environmental department at Intel Corporation. He has been working at Intel for 21 years in many environmental health and safety capacities, and currently leads the PFAS working group internal to Intel, and helps to project manage the SIA Semiconductor PFAS Consortium that intends to work towards developing the technical information that will be required to effectively engage with PFAS regulatory restriction efforts.

Hyeongrak Cho is a water treatment expert and researcher at Kookmin University's Smart Water Environment Leading Laboratory (SWELL). Born in 1986, Cho obtained his Ph.D. in Environmental Engineering from Kookmin University in Seoul, Korea, in September 2019. During his graduate studies, Cho focused his research on the treatment of water, wastewater, and desalination using membranes. In particular, he developed expertise in the treatment of highly concentrated salt wastewater, publishing a paper entitled "Effect of pre-treatment and operating conditions on the performance of membrane distillation for the treatment of shale gas wastewater" in Desalination (IF 6.035). Cho has conducted two successful projects on the treatment of highly concentrated wastewater. The first involved treating shale gas wastewater generated in Texas using the membrane distillation technique, and the second involved treating highly concentrated desalinated seawater using a semi-pilot MD instrument. Manuscripts from these projects are currently being submitted to high-impact water treatment journals. Cho's experience also includes knowledge of MF/UF, coagulation, and sedimentation for pre-treatment and chemical, physical, and ultrasonic washing for post-treatment. He has collaborated on desalination projects involving forward osmosis (FO), reverse osmosis (RO), reverse electrodialysis (RED), and capacitive deionization (CDI). In addition to his research, Cho is studying modeling for the automation of water treatment plants using Cyber-Physical Systems (CPS), Life Cycle Assessment for decreasing Carbon emission, Computational Fluid dynamics, and pipe analysis and design for Ultra pure water supply. Cho believes that his strong understanding of general and next-generation water treatment techniques and his experience in pilot operations make him a valuable asset to any research project.

Bernie Zerfas is a former facilities engineer at GLOBALFOUNDRIES. He has more than 30 years’ experience in the semiconductor industry with a primary focus on UPW and deionized water systems. Although his initial formal training was in chemistry and chemical engineering, he has had a wide variety of formal and informal educational experiences in a variety of technical disciplines. Mr. Zerfas is also an active member of the UPW sub-group of the ITRS; a recent area of focus has been organic and particulate contamination. His current other areas of responsibility include a spectrum of pollution control systems.

Dave Buesser is the COO of FTD Solutions. He is a mechanical engineer from the University of Arizona, and he has spent his entire 27-year career driving advanced technology facilities forward. He began with a focus on semiconductor process piping design and proceeded to build likely the deepest experience in the industry on UPW distribution systems. He has led the design efforts for several UPW plants for greenfield semiconductor facilities and has also led many multi-discipline design teams on microelectronics facilities. Today, his focus is to bring world-class expertise coupled with unique tools to help solve the most pressing UPW and facilities challenges facing advanced industries.

Dr. Rushikesh (Rushi) Matkar is the Pathfinding Technologist for Water purification at Intel’s R&D Center in Hillsboro, OR and a corporate owner for the leadership roadmap of Intel's water management group. Responsible for driving solutions towards the success of Intel's high volume manufacturing roadmap. He is passionate about high purity delivery of utilities, IOT and advanced manufacturing. Between Academia and Industry, Rushi has extensive experience in bringing new IP to Market. Recently, Rushi successfully led the program to introduce EUV Lithography as a patterning solution for fabrication at Globalfoundries. He has served multiple roles within the leading nodes in technology management, operations and engineering management to help multiple technology nodes meet mass-market benefits.

Ovivo

Hideaki IINO is a Chief Researcher at KURITA WATER INDUSTRIES LTD, where he currently manages JDP activities with Interuniversity of MicroElectronics Centre (IMEC) in Belgium. I have been more than 10 years in the semiconductor industry on both the UPW technology and wet process business. I began my semiconductor career from developing particle reduction in UPW with a major component supplier, then subsequently learned the water purification and wet clean processes with IMEC. I have a lot of patents and conference presentations. I am a member of the IRDS UPW group.

Mirko Heinze

More UltraFacility members

Gary van Schooneveld

Sergei Shatsman

Tina Wolff

Sriram Ramamoorthy