A Novel Approach for the Treatment of Wastewater Generated During Semiconductor Wafer Fabrication
Date Published: 2018 | Conference materials
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This presentation was given at the Ultrapure Micro 2018 annual conference. It was presented in the Water Management and Wastewater Treatment track, as part of the Water Management for Advanced Semiconductor Industry session.
Companies: Evonik
Tags: Hydrogen Peroxide (H2O2)Case Study
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