Achieving IPA removal in UPW from marangoni dryers in semiconductor production

Date Published: 2016 | Technical journal archive

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Drying of rinse water from parts is, for many process engineers, a final critical step of a process. Drying steps can be costly, energy and time consuming, and if not done properly will leave a non-volatile residue of minerals, detergents, and ions on the surface of the part - not to mention water stains. There are various methods of drying that may be employed; however, one of the best approaches is Marangoni drying for flat surfaces such as semiconductor wafers or disk drives.

Tags: Ultrapure WaterTotal Organic Carbon (TOC)Isopropyl Alcohol (IPA)Ultraviolet (UV)

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