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Achieving IPA Removal in UPW from Marangoni Dryers in Semiconductor Production

Date Published: 2016 | Technical journal archive

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Drying rinse water can be costly, energy intensive and time consuming. This article highlights the benefits of Marangoni drying for flat surfaces such as semiconductor wafers and disk drivers.

Tags: WastewaterUltraviolet (UV)Isopropyl Alcohol (IPA)Total Organic Carbon (TOC)Water reclamation and reuse

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