Join

Achieving IPA Removal in UPW from Marangoni Dryers in Semiconductor Production

Date Published: 2016 | Technical journal archive

Log in or Join UltraFacility to access this content

To access our resources you will need to be a member of UltraFacility, log in to your account or purchase a membership to view this content.

Already have an account? Log in

Drying rinse water can be costly, energy intensive and time consuming. This article highlights the benefits of Marangoni drying for flat surfaces such as semiconductor wafers and disk drivers.

Tags: WastewaterUltraviolet (UV)Isopropyl Alcohol (IPA)Total Organic Carbon (TOC)Water Reclamation and Reuse

Related content

Conference material | 2022
PFAS Treatment Management and Design Best Practices
Learn more
Training series | 2018
End-of-Pipe Semiconductor Wastewater Reclaim
Learn more
Conference material | 2022
What is Known About Urea Control in UPW Systems?​
Learn more
Conference material | 2024
Hydrofluoric Acid Wastewater Treatment for Recovery and Reuse
Learn more
Back to Technical Knowledge Base

Not an UltraFacility Member?

Be part of year-round collaboration and knowledge exchange. Get access to the full range of tools leveraged by facility representatives and leading global experts from across the supply chain.

JoinLearn more

Book a demo

Find out how you can leverage UltraFacility Portal to achieve your business objectives today.

Request a demo