Development of H₂O₂ monitor most suitable for UPW polishing system
Date Published: 2018 | Technical journal archive
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A newly developed H2O2 monitoring method is capable of continuous measurement without using chemical reagents but catalase-resin instead. This technology also makes it possible to measure H2O2 that is generated in a UV-ox (ultraviolet oxidizer) without interference. This study was conducted to support an ultrapure water (UPW) polishing system, and to compare existing H2O2 monitoring procedures with the new technology. This article was originally published in the Ultrapure Micro Journal in February 2018.
Companies: Nomura Micro Science
Authors: Yukio NoguchiTags: UPW PolishingUltraviolet (UV)Metrology and Analytical TechnologyHydrogen Peroxide (H2O2)
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