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Important Process Considerations in SC1 Cleaning of Silicon Wafers by RCA-based Cleaning Process​

Date Published: 2019 | Conference materials

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This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the High Performance Chemicals in Semiconductor Manufacturing session.

Companies: Sumco USA
Tags: Dissolved GasesMetal ContaminationCost ManagementParticles

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