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Microanalysis of H2O2 in UPW and its Impact on Semiconductor Cleaning Processes

Date Published: 2016 | Conference materials

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This presentation was given at the Ultrapure Micro 2016 annual conference. It was presented in the Ultrapure Water Production track, as part of the Innovation in UPW Technology session.

Authors: Kurt Wostyn, Yukifumi Yoshida
Tags: Wafer DefectivityMetal ContaminationHydrogen Peroxide (H2O2)

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