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Explore the Technical Knowledge Base, a curated collection of 700+ articles, videos, and presentations tailored for professionals in semiconductor manufacturing.

Comparison of Semiconductor Reverse Osmosis System Performance With Conventional and 3D Printed Feed Channels PDF

Training: Functionalized Water Production Methods using 3M Liqui-Cel Membrane Contactors and its effects on Particle Removal Efficiency p-CMP

Exploring Techniques to Comprehensively Characterize Total PFAS Emissions

Physical Intelligence: How the convergence of AI & Robotics allows for architecting Ultra-Efficient Industrial Facilities

Technical Knowledge Base

IPA/H2O waste liquid contains a significant amount of UPW drained to organic wastewater during a single-wafer wet cleaning process. 
Th presented method shows advantage in terms of energy-saving and CO2 emissions reduction. Using this method, the industry can contribute to solving the issue of increasing organic wastewater at semiconductor
manufacturing facilities.

Reduction of Organic Wastewater via IPA and Water Separation Using a Zeolite Membrane, by Experiment and Simulation

Fluorosurfactants are critical components for fab infrastructure which are under the spotlight for their PFAS-leaching potential. Finding alternatives for these fluorosurfactants such as ECTFE or PEEK would reduce the risk of PFAS from semiconductor manufacturing in the future. Reducing use of fluorinated materials in this way works towards a secure and sustainable materials supply chain. 

Towards Non-PFAS Alternatives for Ultra Pure Chemical Delivery Systems in the Next Generation Semiconductor Fab

PFAS has become a target of interest from regulatory bodies, and a potential source of high contaminant levels found in fab wastewater effluent could be UPW and chemical leaching from PFAS type articles (PFA, PVDF, PTFE etc). This presentation details the process and results of testing done on viton o-rings and PFA tubing in different leaching solutions to detect and identify the concentration of PFAS compounds.

Beyond Ambient Water: H2SO4, NH4OH, and high temperature UPW leach-outs for PFAS analysis

Isopropyl alcohol (IPA) is a critical chemical for the wafer cleaning sequence which in increasingly high demand, and purity requirements are likewise becoming increasingly stringent. Robust characterization and subsequent removal of native contaminants in IPA is therefore vital. Using a broad characterization of technical-grade and high purity IPA can build a complete understanding of the chemistry. This custom approach for contamination characterization, testing and removal provides a systematic approach to the entire supply chain of IPA from raw materials to final usage on wafer. 

Analysis and Removal of Native Contamination from Isopropyl Alcohol (IPA)

How do current and proposed standards set by SEMI measure up to the challenge of improving contaminant control for high purity chemicals? SEMI standards for ultrapure water could provide an outline for a future high purity chemistries standard. In this panel, the speakers discussed high purity chemicals and the challenge of contaminant control from various perspectives: setting standards in collaboration with semiconductor end-users, applying standards, and supplying chemicals which meet these standards. 

Ensuring Yield and Reliability Opening Panel: Can SEMI standards be a potential solution to improving control of contaminants in high purity chemicals?

Organic contamination deposited on wafer surfaces can impact deposition and cleaning processes. The current measurement method for organic contaminants uses TD-GCMS, but the industry needs measurement of all organics on the wafer surface at lower levels than is possible using this method. This presentation proposes a novel approach which is much more sensitive than the current industry standard and is capable of measuring high molecular weight, high boiling point contaminants. Through it, the root causes of excursions can be quickly identified and dealt with.  

A Novel Approach for Measuring Organic Contaminants on Semiconductor Wafer Surfaces

The International Roadmap for Devices and Systems (IRDS) and SEMI taskforces offer updates for 2024 and an outlook to the year ahead. On the topic of yield enhancement, speakers discussed UPW, liquid chemicals and particle precursors. Regarding sustainability challenges the panel discussed water reclamation opportunities, the PFAS problem and carbon emission reduction strategies. 

Enabling Advanced Semiconductor Yield and Sustainability via IRDS and SEMI Standards: Pre-conference Workshop

This UltraFacility webinar answers the following questions:

2. What are their use in the semiconductor industry?

Webinar: PFAS Part 1: Regulations and Test Methodologies

Navigate a summary of all the cutting-edge solutions presented at UPM 2023. Find out what industry challenges are being resolved by engineered solutions, and what opportunities lay ahead for improvement.

Technical Knowledge Base

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Highlights

Comparison of Semiconductor Reverse Osmosis System Performance With Conventional and 3D Printed Feed Channels PDF

Training: Functionalized Water Production Methods using 3M Liqui-Cel Membrane Contactors and its effects on Particle Removal Efficiency p-CMP

Exploring Techniques to Comprehensively Characterize Total PFAS Emissions

Physical Intelligence: How the convergence of AI & Robotics allows for architecting Ultra-Efficient Industrial Facilities

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