TSI — Revolutionizing Contamination Control

TSI offers a range of advanced instruments designed to reduce risk during fabrication processes by detecting sub-micron and nanoparticles that can contaminate products.

TSI Nano LPM™ System — A New Frontier in UPW Monitoring

At the forefront of our innovation is the TSI Nano LPM™ System for ultra-pure water (UPW) monitoring. This technology addresses a critical metrology gap in the semiconductor manufacturing industry by providing confident detection of nanoparticles and dissolved content.

• Unmatched Sensitivity: The TSI Nano LPM™ System reliably measures UPW contamination, including suspended particles and dissolved content ≥10 nm. Its linear, matching, and repeatable performance delivers insights that other technologies miss.
• Empowers Data-Driven Decisions: By offering real-time data on UPW quality, the TSI Nano LPM™ System enables users to address issues as they arise, optimize filtration maintenance schedules, and distinguish subtle quality differences at various points in the polish process.
• Advanced Technology: Leveraging TSI’s leadership in aerosolization and condensation particle counting (CPC), the Nano LPM™ System converts UPW impurities into an aerosol to analyze nanoscale contamination, providing a clear picture of water purity.

Delivering Comprehensive Particle Counting Solutions

TSI's expertise extends across a variety of particle counting applications designed to meet the critical needs of the semiconductor industry. Our instruments provide complete contamination detection and help minimize risk in sensitive manufacturing environments.

• 0.1 µm Airborne Particle Counters — Remote Particle Counter | Portable Particle Counter
• 10 nm Cleanroom Water-Based Condensation Particle Counter (CPC)

Long-Standing Leadership and Achievements

Founded in 1961, TSI has built a legacy of scientific excellence and engineering innovation. Our instruments are recognized globally for their precision and reliability. We actively contribute to industry standards and advancements, helping to bridge metrology gaps and define the future of particle measurement. Our solutions are integral to monitoring UPW baselines, managing system maintenance, and detecting excursions before they lead to costly downtime or product defects.