Semiconductor fabs generate CMP wastewater containing azoles, organics (such as isopropyl alcohol), inorganics (such as ammonia), hydrogen peroxide, and other chemical components. A novel chemical agent reacts with azoles and produce a suspended solid that can be easily removed via settling or filtration. This presentation will discuss the existing oxidation-based methods of azoles removal as well as the novel process, and then compare the pros and cons of each option based on a set of possible design cases.